Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography

verfasst von

Lei Zheng, Carsten Reinhardt, Bernhard Roth

Abstract

The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. By improving the printing quality of the structure pattern on transparent foil and employing aberration-corrected optical elements in the systems, high-quality waveguides and gratings at the micro- and nanoscale were successfully fabricated. Especially, minimum feature sizes down to 80 nm using a 100x microscope objective with NA of 1.4 were obtained. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, integrated photonics, and micro- and nanoelectromechanical systems.

Organisationseinheit(en)

PhoenixD: Simulation, Fabrikation und Anwendung optischer Systeme
Hannoversches Zentrum für Optische Technologien (HOT)

Externe Organisation(en)

Hochschule Bremen

Typ

Aufsatz in Konferenzband

Publikationsdatum

15.03.2023

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Elektronische, optische und magnetische Materialien, Physik der kondensierten Materie, Angewandte Informatik, Angewandte Mathematik, Elektrotechnik und Elektronik

Elektronische Version(en)

https://doi.org/10.1117/12.2648032 (Zugang: Geschlossen)