Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography

authored by

Lei Zheng, Carsten Reinhardt, Bernhard Roth

Abstract

The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. By improving the printing quality of the structure pattern on transparent foil and employing aberration-corrected optical elements in the systems, high-quality waveguides and gratings at the micro- and nanoscale were successfully fabricated. Especially, minimum feature sizes down to 80 nm using a 100x microscope objective with NA of 1.4 were obtained. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, integrated photonics, and micro- and nanoelectromechanical systems.

Organisation(s)

PhoenixD: Photonics, Optics, and Engineering - Innovation Across Disciplines
Hannover Centre for Optical Technologies (HOT)

External Organisation(s)

Bremen University of Applied Sciences

Type

Conference contribution

Publication date

15.03.2023

Publication status

Published

Peer reviewed

Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials, Condensed Matter Physics, Computer Science Applications, Applied Mathematics, Electrical and Electronic Engineering

Electronic version(s)

https://doi.org/10.1117/12.2648032 (Access: Closed)