Feature size below 100 nm realized by UV-LED- based microscope projection photolithography

authored by

Lei Zheng, Tobias Birr, Urs Zywietz, Carsten Reinhardt, Bernhard Roth

Abstract

The demand for miniaturization and integration of optical elements has fostered the development of various micro- and nanofabrication technologies. In this work, we developed a low-cost UV-LED-based microscope projection photolithography system for rapid and high-resolution fabrication. This system can be easily implemented using off-the-shelf components. It allows for micro- and nanostructuring within seconds. By optimizing the process, a minimum feature size down to approximately 85 nm was successfully realized. In addition, investigations on fabrication of the same structures using both costly and economic microscope objectives were performed. Feature sizes below 100 nm can be stably achieved. The demonstrated approach extends the technology capabilities and may find applications in fields such as nanophotonics, biophotonics sensing and material science.

Organisation(s)

PhoenixD: Photonics, Optics, and Engineering - Innovation Across Disciplines
Hannover Centre for Optical Technologies (HOT)

External Organisation(s)

Bremen University of Applied Sciences

Type

Article

Journal

Light: Advanced Manufacturing

Volume

4

Pages

1-10

No. of pages

10

ISSN

2689-9620

Publication date

2023

Publication status

Published

Peer reviewed

Yes

ASJC Scopus subject areas

Industrial and Manufacturing Engineering, Materials Science (miscellaneous), Metals and Alloys, Instrumentation

Electronic version(s)

https://doi.org/10.37188/lam.2023.033 (Access: Open)