Reduction of nanoparticles in optical thin films through ion etching

authored by

Joshua McCauley, Marco Jupé, Jinlong Zhang, Andreas Wienke, Detlev Ristau

Abstract

Contaminating particles in optical thin films can lead to the formation of nodules and reduction of laser induced damage threshold (LIDT). This work investigates the suitability of ion etching of the substrates to reduce the impact of nanoparticles. Initial investigations suggest that ion etching can remove nanoparticles from the sample surface; however, doing so introduces texturing to the surface of the substrate. This texturing leads to an increase in optical scattering loss, though LIDT measurements show no significant reduction in the durability of the substrate.

Organisation(s)

PhoenixD: Photonics, Optics, and Engineering - Innovation Across Disciplines
Institute of Quantum Optics

External Organisation(s)

Laser Zentrum Hannover e.V. (LZH)
MOE Key Laboratory of Advanced Micro-Structured Materials
Tongji University

Type

Article

Journal

Applied optics

Volume

62

Pages

B117-B125

ISSN

1559-128X

Publication date

17.01.2023

Publication status

Published

Peer reviewed

Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics, Engineering (miscellaneous), Electrical and Electronic Engineering

Electronic version(s)

https://doi.org/10.1364/AO.478263 (Access: Closed)