Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography

Authored by

Elisavet Chatzizyrli, Alexandra Rittmeier, Sophie Böse, Jörg Neumann, Dietmar Kracht, Moritz Hinkelmann

Abstract

Integrated photonics has the potential to revolutionize telecommunications and computing as electronic circuits approach their physical limits. This study investigates multi-photon lithography (MPL), an innovative method for fabricating photonic integrated circuits, which combines rapid manufacturability with design flexibility but can introduce surface roughness influenced by process parameters. Using ridge waveguides on the photopolymer-on-glass (PoG) platform, surface roughness metrics from laser scanning confocal microscopy (LSCM) and wave optics simulations in ANSYS Lumerical are analyzed. Statistical analysis links process parameters to surface quality, while simulations quantify the impact of roughness on waveguide performance, including scattering-induced losses. This approach facilitates fabrication optimization and enables accurate modeling of 3D-printed photonic components.

Details

Organisation(s): Institute of Photonics
PhoenixD: Photonics, Optics, and Engineering - Innovation Across Disciplines
External Organisation(s): Laser Zentrum Hannover e.V. (LZH)
Type: Conference contribution
Publication date: 19.03.2025
Publication status: Published
Peer reviewed: Yes
ASJC Scopus subject areas: Electronic, Optical and Magnetic Materials, Condensed Matter Physics, Computer Science Applications, Applied Mathematics, Electrical and Electronic Engineering
Electronic version(s): https://doi.org/10.1117/12.3043012 (Access: Closed )