Wave optics simulation of surface roughness for integrated photonics fabricated through multi-photon lithography

verfasst von

Elisavet Chatzizyrli, Alexandra Rittmeier, Sophie Böse, Jörg Neumann, Dietmar Kracht, Moritz Hinkelmann

Abstract

Integrated photonics has the potential to revolutionize telecommunications and computing as electronic circuits approach their physical limits. This study investigates multi-photon lithography (MPL), an innovative method for fabricating photonic integrated circuits, which combines rapid manufacturability with design flexibility but can introduce surface roughness influenced by process parameters. Using ridge waveguides on the photopolymer-on-glass (PoG) platform, surface roughness metrics from laser scanning confocal microscopy (LSCM) and wave optics simulations in ANSYS Lumerical are analyzed. Statistical analysis links process parameters to surface quality, while simulations quantify the impact of roughness on waveguide performance, including scattering-induced losses. This approach facilitates fabrication optimization and enables accurate modeling of 3D-printed photonic components.

Organisationseinheit(en)

Institut für Photonik
PhoenixD: Simulation, Fabrikation und Anwendung optischer Systeme

Externe Organisation(en)

Laser Zentrum Hannover e.V. (LZH)

Typ

Aufsatz in Konferenzband

Publikationsdatum

19.03.2025

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Elektronische, optische und magnetische Materialien, Physik der kondensierten Materie, Angewandte Informatik, Angewandte Mathematik, Elektrotechnik und Elektronik

Elektronische Version(en)

https://doi.org/10.1117/12.3043012 (Zugang: Geschlossen)